Àá½Ã¸¸ ±â´Ù·Á ÁÖ¼¼¿ä. ·ÎµùÁßÀÔ´Ï´Ù.
KMID : 0362120180400030135
Journal of Technologic Dentistry
2018 Volume.40 No. 3 p.135 ~ p.150
A Study on Class Participation Factors that Affect the Class Satisfaction : Focusing on Students of Dental Technology Department
Kwon Soon-Suk

Abstract
Purpose: In this study, we aim to provide primary source of data for developing a learning program that enhances the students¡¯ learning by critically analyzing and adopting the effective class participation factors of the students.

Methods: A questionnaire survey has been conducted from the beginning of May to the end of October, 2017. Subjects of the survey was the dental technology students living in W-city et al by random sampling method along with written informed consent. Out of 630 distributed questionnaires, 584 results were used for our analysis.

Results: Firstly, the average score of the class participation of all the subjects was 3.08 points out of 5.0, which was broken down into class activity (3.53 points), passion about class (3.51 points), communication factors (2.88 points), class preparation (2.77 points), class extension (2.76 points). Secondly, statistically significant correlations were found between class participation and class satisfaction as shown in (p<.01). Class participation factors that affect the class satisfaction were class preparation(p<.001), class activities(p<.001), passion about class(p<.001), which reveals positive and meaningful results. Explanatory power of the model turned out 50.3%.

Conclusion : Considering that class preparation, class activities, and passion about class played a key role in class satisfaction of the student, teachers need to be open minded to reflect the learners¡¯ personalized demands and needs in preparing and managing their class. Additionally should be in tandem that provides the students with various routes of class participation.
KEYWORD
Class participation, Class satisfaction, Dental technology students
FullTexts / Linksout information
Listed journal information
ÇмúÁøÈïÀç´Ü(KCI)